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Eight ORNL Scientists Among World’s Most Cited Researchers

These researchers authored publications that rank in the top 1% by citations for field and publication year in the Web of Science citation index.

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By: DAVID SAVASTANO

Contributing Editor, Coatings World and Ink World, Coatings World and Ink World Magazine

Eight scientists from the Department of Energy’s Oak Ridge National Laboratory are among the world’s most highly cited researchers, according to a bibliometric analysis conducted by the scientific publication analytics firm Clarivate.

The annual “Highly Cited Researchers” list identifies those who demonstrated significant influence in their field through the publication of multiple highly cited papers during the last decade. These researchers authored publications that rank in the top 1% by citations for field and publication year in the Web of Science citation index.

“Our scientists work at the leading edge of scientific discovery,” said ORNL director Thomas Zacharia. “This recognition reflects the laboratory’s contributions to advance what’s known about our world.”

The ORNL scientists listed are:
• Miaofang Chi, Center for Nanophase Materials Sciences
• David Cullen, Center for Nanophase Materials Sciences
• Sheng Dai, Chemical Sciences Division
• Colleen Iversen, Environmental Sciences Division
• Karren More, Center for Nanophase Materials Sciences
• Richard Norby, retired, Environmental Sciences Division
• Gerald Tuskan, Biosciences Division
• Jiaqiang Yan, Materials Science and Technology Division

Arthur Ragauskas, the University of Tennessee-ORNL Governor’s Chair for Biorefining, and David Mandrus, a UT Knoxville professor, are named on the list with ORNL as their second affiliation.

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